Technologies
We offer epitaxy structures on wafers up to 4'' or 8'' as well as process lines on wafers up to 4'' according to application specifications.
Lateral
- AlGaN/GaN-on-Si (N-OFF, N-ON, 48 V, 650 V, 1200 V)
- AlScN/GaN-on-Si
- GaN-on-CMOS hetero-integration (micro-transfer printing [µTP], Wafer-to-Wafer, Si-substrate removal etc.)
- GaN-on-X (X = GaN, SiC, QST®, sapphire, diamond)